NSF AI Disclosure Required
NSF requires disclosure of AI tool usage in proposal preparation. Ensure you disclose the use of FindGrants' AI drafting in your application.
Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model
NSF
About This Grant
Additive Manufacturing (AM) is a multibillion-dollar industry that uses 3D printers to manufacture parts on the basis of computer aided design files. Aircraft parts, space mission parts and biomedical devices are manufactured by AM. Manufacturing-as-a-Service (MaaS) business model has grown significantly in this area because general purpose 3D printers can be used to print a variety of shapes and materials without the need for expensive and time-consuming retooling. Customers on demand outsource part production to providers that offer the best cost, delivery time, and quality. However, the appeal of MaaS is inhibited by various security concerns, both on the customer and the manufacturer side. The customer is concerned with design file misuse, such as its theft, illegal distribution, or infringement of parts. The manufacturer is concerned with a possible bait-and-switch of design files between the quote request and contract. The project’s novelties are to develop security techniques and their interplay that enable a robust watermarking scheme for commonly used design files to address the concerns of both part designers and part manufacturers. The project's broader significance and importance are that the widespread use of MaaS manufacturers for production of industrial components will become more secure for both designers and manufacturers. The novel security measures will help the manufacturing industry grow further significantly. This project devises a solution that addresses concerns of both designers and manufacturers. The conceptual idea relies on the inherent causation between the digital design that defines a part and the physical qualities of the manufactured part. In the envisioned solution, during the quote request phase, a lower quality (LQ) design is shared with multiple manufacturers. The parts produced with such LQ design can exhibit properties such as distorted form, looser fit in the assembly, and degraded functional characteristics like mechanical strength. In addition, such parts can also contain digital and physical watermarks pointing to the manufacturer from whom a quote was requested. Embedded and entangled in each such LQ design are (i) the quality restoration instructions that become available to the contracted manufacturer only and (ii) the robust digital watermark, whose removal or manipulation would prevent quality restoration. Such digital watermarks can be used to establish the provenance of the design and to identify the manufacturer who leaked the design files. The novel security methods that are tested on various complex geometries will help the manufacturing industry to increase the trust in the dynamic supply chain. This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
Grant Summary
Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model is a NSF grant providing up to $800K for university, nonprofit, small business. Applications are due 2028-09-30 (open). Check eligibility and apply with FindGrants.
Focus Areas
Eligibility
How to Apply
Up to $800K
2028-09-30
- 1Confirm your organization is eligible for Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model from NSF, checking organization type, location, and any population or project requirements.
- 2Gather the required documents and information, including your organization details, project plan, and budget figures.
- 3Draft your application narrative and budget addressing the funder's priorities and review criteria. FindGrants can draft each section for you to review and edit.
- 4Review every section against the requirements checklist, then export a submission-ready application pack and submit it to NSF before the deadline.
Don't want to draft it yourself?
We'll draft the complete application against NSF's requirements, run a quality review, and email you a submission-ready PDF plus an editable Word doc within 5 business days. Most orders deliver in 24-48 hours. Flat $399, any grant size.
AI Requirement Analysis
Detailed requirements not yet analyzed
Have the NOFO? Paste it below for AI-powered requirement analysis.
Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model: Frequently Asked Questions
Who is eligible for the Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model?
Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model is offered by NSF and is generally open to university, nonprofit, small business. It is open to organizations nationwide unless the funder specifies otherwise. Review the specific eligibility terms before applying, since funders set their own requirements around organization type, location, and the population or project being served.
How much funding does the Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model provide?
Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model provides up to $800K per award from NSF. Actual award sizes depend on the scope of your project, available program funds, and the number of applicants, so build a budget that reflects realistic, allowable costs rather than the maximum figure.
When is the Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model deadline?
Applications for Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model are due 2028-09-30 (open). Because deadlines can change, verify the date with the funder, NSF, and give yourself enough time to prepare a complete, competitive application before the close date.
How do you apply for the Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model?
To apply for Collaborative Research: SaTC 2.0: RES: Robust Watermarking for Manufacturing-as-a-Service (MaaS) Business Model, confirm your eligibility, gather the required documents, and prepare a narrative and budget that address the funder's priorities. FindGrants guides you step by step and can draft each section, then exports a submission-ready application pack for this grant from NSF.